HYDROGEN PLASMA DEGRADATION OF SNO2F FILMS PREPARED BY THE APCVD METHOD

被引:11
作者
BANERJEE, R [1 ]
DE, A [1 ]
RAY, S [1 ]
BARUA, AK [1 ]
REDDY, SR [1 ]
机构
[1] BHARAT HEAVY ELECT LTD,AMORPHOUS SILICON SOLAR CELL PLANT,GWALPAHARI,HARYANA,INDIA
关键词
D O I
10.1088/0022-3727/26/12/008
中图分类号
O59 [应用物理学];
学科分类号
摘要
Degradation of textured SnO2:F films in glow-discharge hydrogen plasmas at different temperatures and for different times of exposure has been investigated. After exposure, measurement of transmittance and reflectance spectra, scanning electron micrograph observation and Auger analysis have been carried out to determine the extent of degradation. It has been found that the NIR reflectance spectra are sensitive to minute superficial changes, which are not reflected in the visible transmittance spectra and can be used to obtain plasma durability thresholds in textured SnO2:F films. The haze value, measured by a haze meter may not necessarily be an indication of the true surface morphology of a film and its quality.
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收藏
页码:2144 / 2147
页数:4
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