ATOMIC MIGRATION OF METALS IN THE INTERFACES OF AU-SI AND NI-SI FOR CRYSTALLINE AND AMORPHOUS SI OBSERVED BY 40 MEV-O-5+ ION BACKSCATTERING

被引：2

作者：

TAKITA, K

ITOH, H

MURAKAMI, K

MASUDA, K

KUDO, H

SEKI, S

YAMANAKA, M

TAKADA, R

TOMONARI, S

SAITO, T

HAYASHI, Y

机构：

[1] UNIV TSUKUBA,INST APPL PHYS,SAKURA,IBARAKI 305,JAPAN

[2] UNIV TSUKUBA,INST PHYS,SAKURA,IBARAKI 305,JAPAN

[3] ELECTROTECH LAB,SEMICOND DEVICE SECT,SAKURA,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 12期

关键词：

D O I：

10.1143/JJAP.24.L932

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L932 / L934

页数：3

共 7 条

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APPLIED PHYSICS LETTERS, 1985, 47 (03) :236-238

[2] INTERACTION OF METAL LAYERS WITH POLYCRYSTALLINE SI [J].

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MAYER, JW .

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[4] OBSERVATION OF HG DIFFUSION IN CDTE BY MEANS OF 40-MEV O5+ ION BACKSCATTERING [J].

TAKITA, K ;

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OTAKE, H ;

MASUDA, K ;

SEKI, S ;

KUDO, H .

APPLIED PHYSICS LETTERS, 1984, 44 (10) :996-998

[5] CORRECTION [J].

TAKITA, K .

APPLIED PHYSICS LETTERS, 1985, 47 (10) :1119-1119

[6] OBSERVATION OF SURFACE EVAPORATION OF HG FROM HGTE CRYSTALS BY MEANS OF ENERGETIC OXYGEN ION BACKSCATTERING [J].

TAKITA, K ;

MASUDA, K ;

KUDO, H ;

SEKI, S .

APPLIED PHYSICS LETTERS, 1980, 37 (05) :460-462

[7]

Yamanaka M., 1985, Bulletin of the Electrotechnical Laboratory, V49, P175

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