CONTRAST STUDIES IN HIGH-PERFORMANCE PROJECTION OPTICS

被引：7

作者：

OLDHAM, WG

ARDEN, W

机构：

[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

[2] INTEL CORP,SAN JOSE,CA

[3] SIEMENS AG RES LABS,DEPT INTEGRATED CIRCUITS TECHNOL,MUNICH,FED REP GER

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1983年 / 30卷 / 11期

关键词：

D O I：

10.1109/T-ED.1983.21326

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1474 / 1479

页数：6

共 9 条

[1]

ARDEN W, 1982, OCT KOD MICR SEM INT

[2]

ARDEN W, 1982, 1ST INT S VLSI SCI T

[3] INFLUENCE OF AXIAL CHROMATIC ABERRATION IN PROJECTION PRINTING [J].

JAIN, PK ;

NEUREUTHER, AR ;

OLDHAM, WG .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) :1410-1416

[4] HIGH-RESOLUTION LITHOGRAPHY WITH PROJECTION PRINTING [J].

MORITZ, H .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :705-710

[5]

OLDHAM W, 1982, P KODAK MICROELECTRO, P85

[6] OPTICAL REQUIREMENTS FOR PROJECTION LITHOGRAPHY [J].

OLDHAM, WG ;

SUBRAMANIAN, S ;

NEUREUTHER, AR .

SOLID-STATE ELECTRONICS, 1981, 24 (10) :975-980

[7]

OLDHAM WG, 1981, SOLID STATE TECH MAY, P107

[8]

OTOOLE MM, 1979, THESIS U CALIFORNIA

[9] RAPID CALCULATION OF DEFOCUSED PARTIALLY COHERENT IMAGES [J].

SUBRAMANIAN, S .

APPLIED OPTICS, 1981, 20 (10) :1854-1857

← 1 →