INFLUENCE OF AXIAL CHROMATIC ABERRATION IN PROJECTION PRINTING

被引：8

作者：

JAIN, PK

NEUREUTHER, AR

OLDHAM, WG

机构：

[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720

[2] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1981年 / 28卷 / 11期

关键词：

D O I：

10.1109/T-ED.1981.20623

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1410 / 1416

页数：7

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[4]

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MINVIELLE A, 1979, KODAK MICROELECTRONI, P60

[10]

NEUREUTHER AR, 1981, SEMICONDUCTOR MICROL, V6, P110

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