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REMARKS ON TRANSMISSION CHARACTERISTICS OF POSITIVE PHOTORESISTS
被引:2
作者
:
ANDRASI, M
论文数:
0
引用数:
0
h-index:
0
机构:
HUNGARIAN ACAD SCI,TECH PHYS RES INST,H-1325 BUDAPEST,HUNGARY
HUNGARIAN ACAD SCI,TECH PHYS RES INST,H-1325 BUDAPEST,HUNGARY
ANDRASI, M
[
1
]
机构
:
[1]
HUNGARIAN ACAD SCI,TECH PHYS RES INST,H-1325 BUDAPEST,HUNGARY
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1977年
/ 24卷
/ 02期
关键词
:
D O I
:
10.1109/T-ED.1977.18703
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:170 / 172
页数:3
相关论文
共 5 条
[1]
CHARACTERISTICS OF RELIEF PHASE HOLOGRAMS RECORDED IN PHOTORESISTS
[J].
BARTOLINI, RA
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
BARTOLINI, RA
.
APPLIED OPTICS,
1974,
13
(01)
:129
-139
[2]
USE OF PHOTORESIST AS A HOLOGRAPHIC RECORDING MEDIUM
[J].
BEESLEY, MJ
论文数:
0
引用数:
0
h-index:
0
BEESLEY, MJ
;
CASTLEDI.JG
论文数:
0
引用数:
0
h-index:
0
CASTLEDI.JG
.
APPLIED OPTICS,
1970,
9
(12)
:2720
-&
[3]
CHARACTERIZATION OF POSITIVE PHOTORESIST
[J].
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
;
HORNBERGER, WP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HORNBERGER, WP
;
HAUGE, PS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HAUGE, PS
;
SHAW, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
SHAW, JM
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
:445
-452
[4]
OPTICAL LITHOGRAPHY
[J].
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
:440
-444
[5]
NORMAN SL, 1975, APPLIED OPTICS, V14, P819
←
1
→
共 5 条
[1]
CHARACTERISTICS OF RELIEF PHASE HOLOGRAMS RECORDED IN PHOTORESISTS
[J].
BARTOLINI, RA
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
BARTOLINI, RA
.
APPLIED OPTICS,
1974,
13
(01)
:129
-139
[2]
USE OF PHOTORESIST AS A HOLOGRAPHIC RECORDING MEDIUM
[J].
BEESLEY, MJ
论文数:
0
引用数:
0
h-index:
0
BEESLEY, MJ
;
CASTLEDI.JG
论文数:
0
引用数:
0
h-index:
0
CASTLEDI.JG
.
APPLIED OPTICS,
1970,
9
(12)
:2720
-&
[3]
CHARACTERIZATION OF POSITIVE PHOTORESIST
[J].
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
;
HORNBERGER, WP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HORNBERGER, WP
;
HAUGE, PS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HAUGE, PS
;
SHAW, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
SHAW, JM
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
:445
-452
[4]
OPTICAL LITHOGRAPHY
[J].
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
:440
-444
[5]
NORMAN SL, 1975, APPLIED OPTICS, V14, P819
←
1
→