PASSIVATION OF THE INP SURFACE BY O-2 RF PLASMA AND BY VAPOR-PHASE NITRIC-ACID OXIDATION

被引：2

作者：

MICHEL, C

LEPLEY, B

BOUCHIKHI, B

RAVELET, S

机构：

来源：

REVUE DE PHYSIQUE APPLIQUEE | 1983年 / 18卷 / 12期

关键词：

D O I：

10.1051/rphysap:019830018012074500

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：745 / 749

页数：5

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