INVESTIGATION OF THE GAP STATE DISTRIBUTION IN A-SI-H USING POST-TRANSIT PULSE ANALYSIS

被引:4
作者
BARCLAY, RP [1 ]
NESLADEK, M [1 ]
DYER, T [1 ]
KURNIA, D [1 ]
机构
[1] CZECHOSLOVAK ACAD SCI, INST PHYS, CS-18040 PRAGUE, CZECHOSLOVAKIA
关键词
Semiconductor Materials - Hydrogenation - Silicon and Alloys - Amorphous;
D O I
10.1016/0022-3093(89)90130-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The gap state distribution in a-Si:H has been investigated using the recently developed Post-Transit Photocurrent Analysis (PTPA). The authors' analysis, restricted to data obtained from samples with blocking contacts or samples in the p-i-n configuration, provides convincing evidence that PTPA genuinely probes the gap state distribution. Upon light-soaking, a direct relationship was found between the gap state density and the mobility-lifetime product. A maximum in the density of states at approximately 0.6 eV shifts towards mid-gap upon light-soaking. The temperature dependence of the peak yields information about the value of the attempt-to-escape frequency.
引用
收藏
页码:259 / 261
页数:3
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