CHARACTERIZATION OF VAPOR-DEPOSITED TIN-DOPED INDIUM OXIDE-FILMS

被引：13

作者：

ENLOE, JH ^{[1
]}

WIRTZ, GP ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CERAM ENGN,URBANA,IL 61801

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 08期

关键词：

D O I：

10.1149/1.2108972

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1583 / 1587

页数：5

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