INHIBITION PATTERNING OF OXIDE SUPERCONDUCTING FILMS WITH SI ION-IMPLANTATION

被引：9

作者：

MA, QY

DOSANJH, P

WONG, A

CAROLAN, JF

HARDY, WN

机构：

[1] Dept. of Phys., British Columbia Univ., Vancouver, BC

来源：

SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 1994年 / 7卷 / 05期

关键词：

D O I：

10.1088/0953-2048/7/5/017

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new method of inhibition patterning of oxide superconducting (YBCO) films is presented. With implanted Si ions, the YBCO film loses its electrical conductivity and diamagnetism, while its crystalline structure is preserved. The method allows the growth of a second epitaxial YBCO layer on top of the inhibited area, thus providing an effective method of patterning oxide superconductor multilayer structures. Micrometre-sized superconducting lines have been patterned by Si ion implantation with a photoresist mask. Both patterned structures and second-layer films have superconducting properties similar to those of pure YBCO films.

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页码：294 / 297

页数：4

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