MASKLESS ETCHING OF A NANOMETER STRUCTURE BY FOCUSED ION-BEAMS

[1] FIELD-ION EMISSION FROM LIQUID-TIN [J]. PHYSICAL REVIEW LETTERS, 1981, 46 (13) : 865 - 868

[2] SIMPLIFIED ANALYSIS OF POINT-CATHODE ELECTRON SOURCES [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) : 4944 - &

[3] TAPERED WINDOWS IN SIO2, SI3N4, AND POLYSILICON LAYERS BY ION-IMPLANTATION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : 617 - 619

[4] KANAYAMA T, 1979, IECE SSD31 TECHN REP, P29

[5] KNAUER W, 1981, OPTIK, V59, P335

[6] ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE [J]. THIN SOLID FILMS, 1982, 92 (1-2) : 155 - 164

[7] FIELD-EMISSION LIQUID-METAL ION-SOURCE AND TRIODE ION GUN [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2642 - 2645

[8] KOMURO M, 1983, 10TH P INT C EL ION

[9] KOMURO M, 1982, 6TH P S ISIAT 82, P63

[10] KOMURO M, UNPUB APPL PHYS LETT

[1] FIELD-ION EMISSION FROM LIQUID-TIN [J]. PHYSICAL REVIEW LETTERS, 1981, 46 (13) : 865 - 868

[2] SIMPLIFIED ANALYSIS OF POINT-CATHODE ELECTRON SOURCES [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) : 4944 - &

[3] TAPERED WINDOWS IN SIO2, SI3N4, AND POLYSILICON LAYERS BY ION-IMPLANTATION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : 617 - 619

[4] KANAYAMA T, 1979, IECE SSD31 TECHN REP, P29

[5] KNAUER W, 1981, OPTIK, V59, P335

[6] ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE [J]. THIN SOLID FILMS, 1982, 92 (1-2) : 155 - 164

[7] FIELD-EMISSION LIQUID-METAL ION-SOURCE AND TRIODE ION GUN [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2642 - 2645

[8] KOMURO M, 1983, 10TH P INT C EL ION

[9] KOMURO M, 1982, 6TH P S ISIAT 82, P63

[10] KOMURO M, UNPUB APPL PHYS LETT