COCR-SPUTTERING IN LARGE-SCALE ROLL COATING SYSTEMS

被引：5

作者：

MAYR, M ^{[1
]}

LUDWIG, R ^{[1
]}

KASTNER, K ^{[1
]}

KUKLA, R ^{[1
]}

DALMANN, B ^{[1
]}

HABERKORN, H ^{[1
]}

HITZFELD, M ^{[1
]}

机构：

[1] BASF AG,D-6700 LUDWIGSHAFEN,FED REP GER

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1987年 / 23卷 / 05期

关键词：

D O I：

10.1109/TMAG.1987.1065233

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2049 / 2051

页数：3

共 8 条

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[2]

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[4] LARGE-SCALE MAGNETRONS FOR SPUTTERING OF THICK COCR AND NIFE TARGETS [J].

KUKLA, R ;

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[5] HIGH-VACUUM-SPUTTER ROLL COATING FOR PRODUCTION OF MAGNETIC RECORDING MEDIA WITH PERPENDICULAR MAGNETIZATION [J].

MAYR, M ;

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LUDWIG, R .

IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (01) :131-133

[6] COCR THIN-FILMS PREPARED BY HIGH-RATE MAGNETRON SPUTTERING [J].

ROLL, K ;

SCHULLER, KH ;

MUNZ, WD .

IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (05) :771-773

[7] HIGH-RATE MAGNETRON SPUTTERING OF FERROMAGNETIC SMCO, FE AND COCR THIN-FILMS [J].

ROLL, K ;

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MUNZ, WD .

IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (01) :63-65

[8]

WORTS J, 1983, THIN SOLID FILMS, V101, P75

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