MICROSCOPIC X-RAY PHOTOELECTRON-SPECTROSCOPY USING A FOCUSED SOFT-X-RAY BEAM

被引：7

作者：

NINOMIYA, K ^{[3
]}

HIRAI, Y

MOMOSE, A

AOKI, S

SUZUKI, K

机构：

[1] HITACHI LTD,ADV RES LAB,HATOYAMA,SAITAMA 350,JAPAN

[2] UNIV TSUKUBA,INST APPL PHYS,TSUKUBA,IBARAKI 305,JAPAN

[3] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期

关键词：

D O I：

10.1116/1.577606

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An axisymmetric Wolter type mirror is used in a synchrotron radiation beamline to focus 150 eV soft x rays for microscopic x-ray photoelectron spectroscopy (XPS). The focusing characteristics are evaluated for x-ray source sizes of 1 mm, 200 and 120-mu-m in diameter. In this evaluation, the Si(2p) photoelectrons from a Si sample are counted while a knife edge is scanned across the focal point of the mirror. The lateral resolution is 2-mu-m by the 25%-75% criterion, and 4-mu-m by the full width at half-maximum definition in the beam intensity profile. The Wolter type mirror is expected to provide microscopic XPS techniques with micrometer to sub-micrometer resolution.

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收藏

页码：1244 / 1247

页数：4

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