REAL-TIME OBSERVATION OF STEP MOTION ON SI(111) SURFACE BY SCANNING TUNNELING MICROSCOPY

被引:33
作者
TOKUMOTO, H
MIKI, K
MORITA, Y
SATO, T
IWATSUKI, M
SUZUKI, M
FUKUDA, T
机构
[1] JEOL LTD, AKISHIMA, TOKYO 196, JAPAN
[2] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, MUSASHINO, TOKYO 180, JAPAN
关键词
D O I
10.1016/0304-3991(92)90363-O
中图分类号
TH742 [显微镜];
学科分类号
摘要
Scanning tunneling microscopy (STM) was applied for the first time to the real-time observation of the heating-current-induced step motion on the Si(111) surface at temperatures between 1100 and 1142 K near the (1 x 1)-(7 x 7) phase transition. The steps were found to shift in the opposite direction to the heating current direction or electric field. When the DC current flew towards the step-up direction, step bunching was observed: the steps constructed by more than three monolayers were hardly shifted and became centers for step bunching; a single monolayer step shifted easily and caught up with the bunched step (step band); the shifting speed of the single monolayer step (0.1-1.5 nm/s) was dependent both on the separation between the shifting step and the step band and on the number of monolayer steps in the step band. On the contrary, the step-down current caused step de-bunching and shifting of the step band. In order to explain this behavior, we propose an electric-field-induced model together with the presence of pinning centers such as impurities, stresses. or adsorbates.
引用
收藏
页码:816 / 823
页数:8
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