CHARGED-PARTICLE DENSITIES AND KINETICS IN A RADIOFREQUENCY SF6 PLASMA

被引:29
作者
KONO, A
ENDO, M
OHATA, K
KISHIMOTO, S
GOTO, T
机构
[1] Department of Information Electronics, School of Engineering, Nagoya University, Chikusa-ku
关键词
D O I
10.1063/1.358003
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electron, negative ion, and positive ion densities in a capacitively-coupled radio-frequency (rf, 13.56 MHz) SF6 plasma have been investigated as functions of the pressure (30-700 mTorr) and rf power. The decay of the charged particle densities in the afterglow has also been studied to obtain information about their kinetics. The electron density was determined by using a microwave cavity resonance technique. Negative ions were detected by measuring the density of photodetached electrons produced by pulsed laser irradiation of the plasma. The positive ion density was obtained from Langmuir probe measurements. At a rf power of 0.13 W/cm2 and at low pressures (≲100 mTorr) the positive ion density, which is virtually equal to the negative ion density, is found to be larger than the electron density by a factor of a few hundred; the ion/electron density ratio increases with increasing pressure to reach a value of a few thousand at high pressures. Wavelength-dependent photodetachment measurements indicate that the dominant contribution to the photodetachment signal at 266 nm comes from F-, but F- is a minor negative-ion species with respect to the density; that is, the photodetachment efficiency for the dominant negative ion species (supposed to be SF-5) is low. The recombination rate constant for F- (supposedly with SF+5) is suggested to be an order of magnitude larger than that for the dominant ion species, the latter being estimated to be slightly smaller than 10-7 cm3 s-1. © 1994 American Institute of Physics.
引用
收藏
页码:7221 / 7230
页数:10
相关论文
共 30 条
[1]   EXPERIMENTAL CHARACTERISTICS OF RF PARALLEL-PLATE DISCHARGES - INFLUENCE OF ATTACHING GASES [J].
BLETZINGER, P .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (01) :130-138
[2]   THE NEGATIVE-ION STATES OF SULFUR-HEXAFLUORIDE [J].
CHEN, ECM ;
SHUIE, LR ;
DSA, ED ;
BATTEN, CF ;
WENTWORTH, WE .
JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (08) :4711-4719
[3]   BINARY IONIC RECOMBINATION OF SF-5(-) AND SF-6(-) AT 300-K [J].
CHURCH, MJ ;
SMITH, D .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1977, 23 (02) :137-145
[4]   THERMAL ELECTRON-ATTACHMENT TO SF6 AND CFCL3 [J].
CROMPTON, RW ;
HADDAD, GN .
AUSTRALIAN JOURNAL OF PHYSICS, 1983, 36 (01) :15-25
[5]   COMPARISON OF EXPERIMENTAL MEASUREMENTS AND MODEL PREDICTIONS FOR RADIO-FREQUENCY AR DISCHARGES AND SF6 DISCHARGES [J].
GOGOLIDES, E ;
NICOLAI, JP ;
SAWIN, HH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :1001-1006
[6]   CONTINUUM MODELING OF RADIOFREQUENCY GLOW-DISCHARGES .1. THEORY AND RESULTS FOR ELECTROPOSITIVE AND ELECTRONEGATIVE GASES [J].
GOGOLIDES, E ;
SAWIN, HH .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) :3971-3987
[7]   CONTINUUM MODELING OF RADIOFREQUENCY GLOW-DISCHARGES .2. PARAMETRIC STUDIES AND SENSITIVITY ANALYSIS [J].
GOGOLIDES, E ;
SAWIN, HH .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) :3988-4002
[8]   NEGATIVE-ION KINETICS IN RF GLOW-DISCHARGES [J].
GOTTSCHO, RA ;
GAEBE, CE .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) :92-102
[9]   MEASUREMENTS OF NEGATIVE-ION DENSITIES IN 13.56-MHZ RF PLASMAS OF CF4, C2F6, CHF3, AND C3F8 USING MICROWAVE RESONANCE AND THE PHOTODETACHMENT EFFECT [J].
HAVERLAG, M ;
KONO, A ;
PASSCHIER, D ;
KROESEN, GMW ;
GOEDHEER, WJ ;
DEHOOG, FJ .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) :3472-3480
[10]   ELECTRON-ATTACHMENT TO THE PERFLUOROALKANES N-CNF2N+2(N=1-6) USING HIGH-PRESSURE SWARM TECHNIQUES [J].
HUNTER, SR ;
CHRISTOPHOROU, LG .
JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (12) :6150-6164