OPTICAL STUDIES OF VERTICAL AMBIPOLAR TRANSPORT AND INTERFACE RECOMBINATION VELOCITIES IN GAAS/AL0.5GA0.5AS DOUBLE-QUANTUM-WELL HETEROSTRUCTURES

被引:45
作者
HILLMER, H
FORCHEL, A
KUHN, T
MAHLER, G
MEIER, HP
机构
[1] UNIV STUTTGART,INST PHYS 4,W-7000 STUTTGART 80,GERMANY
[2] UNIV STUTTGART,INST THEORET PHYS,W-7000 STUTTGART 80,GERMANY
[3] IBM CORP,DIV RES,FORSCH LAB ZURICH,CH-8803 RUSCHLIKON,SWITZERLAND
[4] DEUTSCH BUNDESPOST TELEKOM,FTZ FORSCHUNGSINST,W-6100 DARMSTADT,GERMANY
[5] UNIV WURZBURG,W-8700 WURZBURG,GERMANY
来源
PHYSICAL REVIEW B | 1991年 / 43卷 / 17期
关键词
D O I
10.1103/PhysRevB.43.13992
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a detailed experimental and theoretical study of vertical ambipolar transport in semiconductor heterostructures. A high-resolution time-of-flight method using two vertically separated quantum wells of different well widths is applied to probe the carrier transport perpendicular to the heterointerfaces. By a numerical simulation the ambipolar diffusivities as well as surface and interface recombination velocities in GaAs/Al(x)Ga(1-x)As structures are determined. This paper emphasizes the importance of surface and interface recombination for the analysis of the transport data. Alloy-disorder scattering is found to limit the ambipolar mobilities between 40 and 120 K in the Al0.5Ga0.5As barriers with acoustic-deformation-potential and polar-optical scattering participating above 120 K. In addition to the transport properties, we also obtain information on carrier capture from the barrier layers into the quantum well as a function of temperature.
引用
收藏
页码:13992 / 14000
页数:9
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