AUTOMATED LANGMUIR PROBE CHARACTERIZATION OF METHANE/HYDROGEN LOW-PRESSURE RADIO-FREQUENCY DISCHARGES IN A PRODUCTION REACTOR

被引:8
作者
CALI, FA
HERBERT, PAF
KELLY, WM
机构
[1] National Microelectronics Research Centre, Cork, Prospect Row
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 06期
关键词
D O I
10.1116/1.579614
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An automated, tuned Langmuir probe has been applied to a commercial, multiply used reactive ion etcher operated by radio frequency-generated 13.56 MHz low-pressure discharges. The probe was used to measure the plasma parameters and electron energy distribution function in a methane/ hydrogen plasma, an important etchant of optoelectronic semiconductors. Results have revealed a typical electron temperature of approximately 1.5 eV, an electron density of 6X10(9) cm(-3), and a plasma potential of 28 V. The electron energy distribution function is bi-Maxwellian with a dip appearing at 6 eV, which corresponds to the vibrational state of the methane radical and supports a hypothesis of electron absorption by the radical at this energy. The precautions required to condition both probe and chamber to obtain reliable data are given, and it is shown that the automated Langmuir probe can operate as an in situ diagnostic in polymer producing processing plasmas in operational reactors providing stringent routines are implemented. (C) 1995 American Vacuum Society.
引用
收藏
页码:2920 / 2923
页数:4
相关论文
共 13 条
[1]   PLASMA PARAMETERS OF A RADIO-FREQUENCY DISCHARGE [J].
ANDERSON, CA ;
HOPKINS, MB ;
GRAHAM, WG .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (01) :448-450
[2]   USE OF A CYLINDRICAL LANGMUIR PROBE FOR THE CHARACTERIZATION OF CHARGED-PARTICLE POPULATIONS IN A PLANAR, DIODE GLOW-DISCHARGE DEVICE [J].
FANG, D ;
MARCUS, RK .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1990, 45 (09) :1053-1074
[3]   Measurements of electron energy distribution in low-pressure RF discharges [J].
Godyak, V. A. ;
Piejak, R. B. ;
Alexandrovich, B. M. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (01) :36-58
[4]   LANGMUIR PROBE TECHNIQUE FOR PLASMA PARAMETER MEASUREMENT IN A MEDIUM DENSITY DISCHARGE [J].
HOPKINS, MB ;
GRAHAM, WG .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1986, 57 (09) :2210-2217
[5]  
MANTEI TD, 1990, P SOC PHOTO-OPT INS, V1392, P466
[6]   ON THE CHARACTERIZATION OF A RF PARALLEL PLATE DISCHARGE [J].
OELERICHHILL, G ;
PUKROPSKI, I ;
KUJAWKA, M .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1991, 24 (04) :593-601
[7]   BOLTZMANN-EQUATION ANALYSIS OF ELECTRON SWARM BEHAVIOR IN METHANE [J].
OHMORI, Y ;
KITAMORI, K ;
SHIMOZUMA, M ;
TAGASHIRA, H .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (03) :437-455
[8]   A TUNED LANGMUIR PROBE FOR MEASUREMENTS IN RF GLOW-DISCHARGES [J].
PARANJPE, AP ;
MCVITTIE, JP ;
SELF, SA .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (11) :6718-6727
[9]  
Scanlan J V, 1991, THESIS
[10]   LANGMUIR PROBE MEASUREMENTS OF THE ELECTRON-ENERGY DISTRIBUTION FUNCTION IN RADIOFREQUENCY PLASMAS [J].
SCANLAN, JV ;
HOPKINS, MB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04) :1207-1211