THIN-FILM MONITORING WITH ELLIPSOMETRY IN IN-LINE PROCESSING EQUIPMENT

被引:5
作者
HAYASHI, Y
机构
[1] Institute for Super Materials, ULVAC Japan Ltd., Tsukuba
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 11期
关键词
ELLIPSOMETER; PROCESS MONITORING; THIN FILM; IN-LINE EQUIPMENT; PLASMA CVD;
D O I
10.1143/JJAP.29.2514
中图分类号
O59 [应用物理学];
学科分类号
摘要
An ellipsometer for in-line monitoring has been developed. The construction is simple and it determines both the refractive index and thickness of a film in about 5 seconds through a simple and fast calculation method. The ellipsometer was set under an unloading chamber of in-line processing equipment and the optical alignment was adjusted with a simple method. For examination, SiN(x) films have been monitored. The results have been that the measurement was precise and the in-line monitoring of the film was successively performed.
引用
收藏
页码:2514 / 2518
页数:5
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