EFFECT OF A SOLUTE ADDITION (TA) ON LOW-TEMPERATURE SELF-DIFFUSION PROCESSES IN GOLD

被引：21

作者：

GUPTA, D ^{[1
]}

ROSENBERG, R ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

THIN SOLID FILMS | 1975年 / 25卷 / 01期

关键词：

D O I：

10.1016/0040-6090(75)90254-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：171 / 180

页数：10

共 38 条

[1] FREE VOLUME AS A CRITERION FOR GRAIN-BOUNDARY MODELS [J].

AARON, HB ;

BOLLING, GF .

SURFACE SCIENCE, 1972, 31 (01) :27-&

[2] FREE VOLUME AS A GUIDE TO GRAIN-BOUNDARY PHENOMENA [J].

AARON, HB ;

BOLLING, GF .

SCRIPTA METALLURGICA, 1972, 6 (07) :553-&

[3] REDUCTION OF ELECTROMIGRATION IN ALUMINUM FILMS BY COPPER DOPING [J].

AMES, I ;

DHEURLE, FM ;

HORSTMANN, RE .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (04) :461-+

[4]

[Anonymous], PHYS THIN FILMS

[5] SURFACE SELF-DIFFUSION ON A FCC CRYSTAL - ATOMIC VIEW [J].

AYRAULT, G ;

EHRLICH, G .

JOURNAL OF CHEMICAL PHYSICS, 1974, 60 (01) :281-294

[6] MEASUREMENTS OF SELF-DIFFUSION RATES ALONG DISLOCATIONS IN FCC METALS [J].

BALLUFFI, RW .

PHYSICA STATUS SOLIDI, 1970, 42 (01) :11-&

[7] ELECTROMIGRATION IN THIN AL FILMS [J].

BLECH, IA ;

MEIERAN, ES .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) :485-&

[8] STRUCTURE AND THERMAL-STABILITY OF SPUTTERED AU-TA FILMS [J].

CHRISTOU, A ;

DAY, H .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (08) :3386-3393

[9]

GIFKINS RC, 1969, INTERFACES C P, P29

[10] SELF-DIFFUSION IN GOLD [J].

GILDER, HM ;

LAZARUS, D .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1965, 26 (12) :2081-&

← 1 2 3 4 →