INGAAS INP COMPOSITE COLLECTOR HETEROSTRUCTURE BIPOLAR-TRANSISTORS

被引:28
作者
FEYGENSON, A
RITTER, D
HAMM, RA
SMITH, PR
MONTGOMERY, RK
YADVISH, RD
TEMKIN, H
PANISH, MB
机构
[1] AT&T Bell Laboratories, Murray Hill
关键词
BIPOLAR DEVICES; TRANSISTORS; SEMICONDUCTOR DEVICES AND MATERIALS;
D O I
10.1049/el:19920383
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A high speed bipolar transistor with high breakdown voltage BV(CEO) is described. The structure uses a composite collector of InGaAs and InP. A common emitter gain of 65 is obtained with a base doping of 7 x 10(19) cm-3 and a breakdown voltage in excess of 10 V. The f(T) = 64 GHz was reached at a collector-emitter voltage of 2 V and a current density of 52 kA/cm2. The potential of this structure for very high speed applications is demonstrated by the extracted intrinsic transit time of 0.4 ps.
引用
收藏
页码:607 / 609
页数:3
相关论文
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[11]   INP/INGAAS DOUBLE HETEROJUNCTION BIPOLAR-TRANSISTORS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY WITH SULFUR-DELTA DOPING IN THE COLLECTOR REGION [J].
TOKUMITSU, E ;
DENTAI, AG ;
JOYNER, CH ;
CHANDRASEKHAR, S .
APPLIED PHYSICS LETTERS, 1990, 57 (26) :2841-2843