CW IMPATTS MADE FROM SILICON MOLECULAR-BEAM EPITAXY MATERIAL

被引:7
作者
LUY, JF
KIBBEL, H
KASPER, E
机构
来源
INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES | 1986年 / 7卷 / 03期
关键词
D O I
10.1007/BF01010849
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:305 / 315
页数:11
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