DESIGN OF EPITAXIAL CVD REACTORS .1. THEORETICAL RELATIONSHIPS FOR MASS AND HEAT-TRANSFER

被引:6
作者
KLINGMAN, KJ [1 ]
LEE, HH [1 ]
机构
[1] UNIV FLORIDA,DEPT CHEM ENGN,GAINESVILLE,FL 32611
关键词
D O I
10.1016/0022-0248(85)90219-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:670 / 678
页数:9
相关论文
共 13 条
[1]   TRANSPORT PHENOMENA MEASUREMENTS IN EPITAXIAL REACTORS [J].
BAN, VS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (02) :317-320
[2]  
BIRD RB, 1960, TRANSPORT PHENOMENA, pCH19
[3]  
CLAASSEN WAP, 1981, PHILIPS J RES, V36, P124
[4]   A STAGNANT LAYER MODEL FOR EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR [J].
EVERSTEYN, FC ;
SEVERIN, PJW ;
BREKEL, CHJV ;
PEEK, HL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) :925-+
[5]  
Ghandhi S.K, 1995, VLSI FABRICATION PRI
[7]  
Hartree DR, 1937, P CAMB PHILOS SOC, V33, P223
[8]  
Jones CW, 1963, LAMINAR BOUNDARY LAY, P198
[9]   VARIATION OF GAAS EPITAXIAL-GROWTH RATE WITH DISTANCE ALONG SUBSTRATE WITHIN A CONSTANT TEMPERATURE ZONE [J].
KOMENO, J ;
OHKAWA, S ;
MIURA, A ;
DAZAI, K ;
RYUZAN, O .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (09) :1440-1443
[10]  
Lee H.H., 1985, HETEROGENEOUS REACTO