VARIATION OF GAAS EPITAXIAL-GROWTH RATE WITH DISTANCE ALONG SUBSTRATE WITHIN A CONSTANT TEMPERATURE ZONE

被引：14

作者：

KOMENO, J ^{[1
]}

OHKAWA, S ^{[1
]}

MIURA, A ^{[1
]}

DAZAI, K ^{[1
]}

RYUZAN, O ^{[1
]}

机构：

[1] FUJITSU LABS LTD,KAWASAKI,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 09期

关键词：

D O I：

10.1149/1.2133670

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1440 / 1443

页数：4

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