MECHANISMS AND THEORY OF PHYSICAL SPUTTERING BY PARTICLE IMPACT

[1] THE EFFECT OF ION MASS AND TARGET TEMPERATURE ON THE ENERGY-DISTRIBUTION OF SPUTTERED ATOMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 170 (1-3): : 327 - 330

[2] SELF-ION SPUTTERING YIELDS FOR COPPER, NICKEL, AND ALUMINUM [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1982, 194 (1-3): : 615 - 619

[3] COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 257 - 278

[4] SPUTTERING EXPERIMENTS IN THE HIGH ENERGY REGION [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 279 - 289

[5] THERMODYNAMIC APPROACH TO QUANTITATIVE INTERPRETATION OF SPUTTERED ION MASS-SPECTRA [J]. ANALYTICAL CHEMISTRY, 1973, 45 (08) : 1421 - 1438

[6] Andersen H. H., 1984, Ion implantation and beam processing, P127

[7] Andersen H. H., 1973, Radiation Effects, V19, P139, DOI 10.1080/00337577308232233

[8] THE ANGULAR-DISTRIBUTION OF MATERIAL SPUTTERED FROM AGAU AND CUPT BY20-80KEV ARGON [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3): : 241 - 244

[9] ANGULAR-DISTRIBUTION OF PARTICLES SPUTTERED FROM CU, PT AND GE TARGETS BY KEV AR+ ION-BOMBARDMENT [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 6 (03) : 459 - 465

[10] MEASUREMENTS OF ANGULAR-DISTRIBUTIONS OF SPUTTERED MATERIAL AS A NEW TOOL FOR SURFACE-SEGREGATION STUDIES - SEGREGATION IN CUPT ALLOYS [J]. SURFACE SCIENCE, 1982, 123 (01) : 39 - 46

[1] THE EFFECT OF ION MASS AND TARGET TEMPERATURE ON THE ENERGY-DISTRIBUTION OF SPUTTERED ATOMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 170 (1-3): : 327 - 330

[2] SELF-ION SPUTTERING YIELDS FOR COPPER, NICKEL, AND ALUMINUM [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1982, 194 (1-3): : 615 - 619

[3] COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 257 - 278

[4] SPUTTERING EXPERIMENTS IN THE HIGH ENERGY REGION [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 279 - 289

[5] THERMODYNAMIC APPROACH TO QUANTITATIVE INTERPRETATION OF SPUTTERED ION MASS-SPECTRA [J]. ANALYTICAL CHEMISTRY, 1973, 45 (08) : 1421 - 1438

[6] Andersen H. H., 1984, Ion implantation and beam processing, P127

[7] Andersen H. H., 1973, Radiation Effects, V19, P139, DOI 10.1080/00337577308232233

[8] THE ANGULAR-DISTRIBUTION OF MATERIAL SPUTTERED FROM AGAU AND CUPT BY20-80KEV ARGON [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3): : 241 - 244

[9] ANGULAR-DISTRIBUTION OF PARTICLES SPUTTERED FROM CU, PT AND GE TARGETS BY KEV AR+ ION-BOMBARDMENT [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 6 (03) : 459 - 465

[10] MEASUREMENTS OF ANGULAR-DISTRIBUTIONS OF SPUTTERED MATERIAL AS A NEW TOOL FOR SURFACE-SEGREGATION STUDIES - SEGREGATION IN CUPT ALLOYS [J]. SURFACE SCIENCE, 1982, 123 (01) : 39 - 46