THEORY OF HIGH-TEMPERATURE OXIDE DECOMPOSITION AT THE SIO2/SI INTERFACE

被引:4
作者
BRADLEY, RM
机构
关键词
D O I
10.1063/1.338255
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:545 / 548
页数:4
相关论文
共 10 条
  • [1] Abramowitz M., 1972, HDB MATH FUNCTIONS, P496
  • [2] DUFF GFD, 1966, DIFFERENTIAL EQUATIO, P282
  • [3] HOFMANN K, UNPUB APPL PHYS LETT
  • [4] HOFMANN K, UNPUB
  • [5] ELECTRICAL-PROPERTIES OF STACKING-FAULTS AND PRECIPITATES IN HEAT-TREATED DISLOCATION-FREE CZOCHRALSKI SILICON
    KIMERLING, LC
    LEAMY, HJ
    PATEL, JR
    [J]. APPLIED PHYSICS LETTERS, 1977, 30 (05) : 217 - 219
  • [6] KOBAYASHI M, 1985, J ELECTROCHEM SOC, V132, pC97
  • [7] OLVER FWJ, 1972, HDB MATH FUNCTIONS, P360
  • [8] HIGH-TEMPERATURE SIO2 DECOMPOSITION AT THE SIO2/SI INTERFACE
    TROMP, R
    RUBLOFF, GW
    BALK, P
    LEGOUES, FK
    VANLOENEN, EJ
    [J]. PHYSICAL REVIEW LETTERS, 1985, 55 (21) : 2332 - 2335
  • [9] TROMP RM, UNPUB
  • [10] YANG KH, 1984, J ELECTROCHEM SOC, V131, P1141