SPUTTERING BEHAVIOR OF BORON AND BORON-CARBIDE

被引：13

作者：

HECHTL, E ^{[1
]}

MAZANEC, A ^{[1
]}

ECKSTEIN, W ^{[1
]}

ROTH, J ^{[1
]}

GARCIAROSALES, C ^{[1
]}

机构：

[1] MAX PLANCK INST PLASMA PHYS,EURATOM ASSOC,W-8046 GARCHING,GERMANY

来源：

JOURNAL OF NUCLEAR MATERIALS | 1992年 / 196卷

关键词：

D O I：

10.1016/S0022-3115(06)80129-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sputtering yields of boron were measured with D+ and B+ ions for normal and oblique angles of incidence. Self-sputtering data of boron carbide were simulated in the experiment by using Ne+ ions. The energies of the impinging ions were between 20 eV and 10 keV. The measured data are compared with computer simulated values calculated with the TRIM.SP program. The boron data for normal ion impact are higher than the calculated values, whereas those for oblique ion incidence are smaller than the calculation predicts. This discrepancy is explained by the surface roughness and supported by SEM micrographs. The comparison of the boron carbide data with TRIM.SP calculations shows much better agreement than the boron data. In this case the target surface was much smoother.

引用

页码：713 / 716

页数：4

共 13 条

[1]

BOHDANSKY J, 1984, NUCL FUSION, P61

[2] BULK-BORONIZED LIMITER OPERATION IN THE WENDELSTEIN 7-AS STELLARATOR [J].

BRAKEL, R ;

BURHENN, R ;

BEHRISCH, R ;

GRIGULL, P ;

HACKER, H ;

HILDEBRANDT, D ;

HIROOKA, Y ;

HOFMANN, JV ;

MAHN, C ;

ROTH, J ;

SCHNEIDER, U ;

WELLER, A .

JOURNAL OF NUCLEAR MATERIALS, 1992, 196 :431-435

[3]

GARCIAROSALES C, IN PRESS J NUCL MATE

[4] AN ION OPTICAL DECEL SYSTEM FOR OBLIQUE ANGULAR IMPACT OF LOW-ENERGY IONS ON TARGETS [J].

HECHTL, E .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 70 (1-4) :441-444

[5] A VARIABLE GEOMETRY RETARDATION COLLECTOR FOR LOW-ENERGY SPUTTERING EXPERIMENTS [J].

HECHTL, E .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 186 (1-2) :453-455

[6] LOW-ENERGY ION-BEAM WORK FOR THE PREPARATION OF VARIOUS DELICATE ISOTOPIC SAMPLES AS WELL AS FOR SPUTTERING AND IMPLANTATION TASKS [J].

HECHTL, E .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 26 (1-3) :37-43

[7]

HECHTL E, 1984, J NUCL MATER, V122, P1431

[8] DECELERATION ION OPTICAL-SYSTEM FOR SPUTTERING MEASUREMENTS BETWEEN 50 AND 500 EV AS FUNCTION OF ANGLE OF INCIDENCE [J].

LIEBL, H ;

BOHDANSKY, J ;

ROTH, J ;

DOSE, V .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (10) :1830-1832

[9]

ROTH J, 1991, NUCL FUSION, V1, P63

[10] SPUTTERING OF LOW-Z MATERIALS [J].

ROTH, J ;

ECKSTEIN, W ;

GAUTHIER, E ;

LASZLO, J .

JOURNAL OF NUCLEAR MATERIALS, 1991, 179 :34-36

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