AN ENHANCED SENSITIVITY NULL ELLIPSOMETRY TECHNIQUE FOR STUDYING FILMS ON SUBSTRATES - APPLICATION TO SILICON-NITRIDE ON GALLIUM-ARSENIDE

被引：16

作者：

ALTEROVITZ, SA

BUABBUD, GH

WOOLLAM, JA

LIU, DC

机构：

[1] UNIV NEBRASKA,DEPT ELECT ENGN,LINCOLN,NE 68588

[2] NASA,LEWIS RES CTR,CLEVELAND,OH 44135

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 03期

关键词：

D O I：

10.1063/1.332137

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1559 / 1569

页数：11

共 20 条

[1]

ADAMS JR, 1976, APPL OPTICS, V15, P3179, DOI 10.1364/AO.15.003179

[2]

ALTEROVITZ SA, 1982, APPL PHYS COMMUN, V1, P163

[3]

ALTEROVITZ SA, UNPUB

[4] STUDIES OF SURFACE, THIN-FILM AND INTERFACE PROPERTIES BY AUTOMATIC SPECTROSCOPIC ELLIPSOMETRY [J].

ASPNES, DE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :289-295

[5] OPTICAL-PROPERTIES OF THIN-FILMS [J].

ASPNES, DE .

THIN SOLID FILMS, 1982, 89 (03) :249-262

[6] ELLIPSOMETRIC FUNCTION OF A FILM-SUBSTRATE SYSTEM - APPLICATIONS TO DESIGN OF REFLECTION-TYPE OPTICAL DEVICES AND TO ELLIPSOMETRY [J].

AZZAM, RMA ;

ZAGHLOUL, ARM ;

BASHARA, NM .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1975, 65 (03) :252-260

[7] VARIATION IN THE STOICHIOMETRY OF THIN SILICON-NITRIDE INSULATING FILMS ON SILICON AND ITS CORRELATION WITH MEMORY TRAPS [J].

BAILEY, RS ;

KAPOOR, VJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :484-487

[8]

BASAVAIAH S, 1974, J APPL PHYS, V45, P456

[9] PARAMETER CORRELATION AND PRECISION IN MULTIPLE-ANGLE ELLIPSOMETRY [J].

BUABBUD, GH ;

BASHARA, NM .

APPLIED OPTICS, 1981, 20 (17) :3020-3026

[10]

BUABBUD GH, 1983, UNPUB J VAC SCI MAR, V22, pCH4

← 1 2 →