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INVESTIGATIONS ON CUBIC TI(B,N) FILMS PREPARED BY REACTIVE DIODE RF-SPUTTERING FROM A TIB2 TARGET

被引：21
作者：
SELBACH, E
SCHMIDT, K
WANG, M
机构：
[1] Kernforschungsanlage Jülich, Institut für Schicht - und lonentechnik, Association Euratom
来源：
THIN SOLID FILMS | 1990年 / 188卷 / 02期
关键词：
D O I：
10.1016/0040-6090(90)90289-P
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The preparation of cubic Ti(B,N) films by reactive diode sputtering is repoted. The structure and the composition of the films were determined by transmission electron diffraction, Rutherford backscattering and the nuclear reaction 11B (p,α)9Be. The determination of mechanical properties such as microhardness and intrinsic stress was performed with an ultralow load indentation and a surface profilometer respectively. © 1990.
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页码：267 / 274
页数：8
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