ATOMIC-STRUCTURE OF ION-IMPLANTATION DAMAGE AND PROCESS OF AMORPHIZATION IN SEMICONDUCTORS

被引：74

作者：

NARAYAN, J

FATHY, D

OEN, OS

HOLLAND, OW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 03期

关键词：

D O I：

10.1116/1.572399

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：1303 / 1308

页数：6

相关论文

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