RESISTANCE SWITCHING CHARACTERISTICS IN POLYCRYSTALLINE SILICON FILM RESISTORS

被引：10

作者：

LU, CY

LU, NCC

SHIH, CC

机构：

[1] N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695

[2] NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN

[3] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 05期

关键词：

D O I：

10.1149/1.2114057

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1193 / 1196

页数：4

共 21 条

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