RELIABILITY OF MOS LSI CIRCUITS

被引:10
作者
COLBOURNE, ED [1 ]
COVERLEY, GP [1 ]
BEHERA, SK [1 ]
机构
[1] MICROSYST INT LTD, OTTAWA, ONTARIO, CANADA
关键词
D O I
10.1109/PROC.1974.9412
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:244 / 259
页数:16
相关论文
共 39 条
[1]  
ADAMS JD, 1965, ELECTRON DES NOV, P54
[2]  
BEHERA SK, 1972, 10 ANN P REL PHYS, P5
[3]  
BLACK JR, 1967, 6 P ANN REL PHYS S, V6, P148
[4]  
BRAUER JB, 1966, ELECTRON IND APR, P67
[5]  
DUMMER G, 1971, NEW SCIENTIST SC JUL, P75
[6]  
EBEL GH, 1973, 11TH ANN P REL PHYS, P108
[7]   MODES OF FAILURE OF MOS DEVICES [J].
ECCLESTON, W ;
PEPPER, M .
MICROELECTRONICS RELIABILITY, 1971, 10 (05) :325-+
[8]   SODIUM ION DRIFT THROUGH PHOSPHOSILICATE GLASS-SIO2 FILMS [J].
ELDRIDGE, JM ;
KERR, DR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (06) :986-&
[9]  
EMELIANOFF MD, 1968, ELECTRON ENG, P49
[10]  
FOX R, 1972, MICROELECTRONICS, V4, P8