CONTROL OF SILICON NETWORKS STRUCTURE IN PLASMA DEPOSITION

被引：224

作者：

TSAI, CC

ANDERSON, GB

THOMPSON, R

WACKER, B

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 114卷

关键词：

D O I：

10.1016/0022-3093(89)90096-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：151 / 153

页数：3

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