EPITAXIAL-GROWTH OF SI ON GAP(100) AND SI(111), MONITORED BY SOFT-X-RAY REFLECTION

被引:3
作者
BRUIJN, MP
MULLER, H
VERHOEVEN, J
VANDERWIEL, MJ
机构
关键词
D O I
10.1016/0039-6028(85)90051-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:601 / 613
页数:13
相关论文
共 16 条
[1]   SURFACE PROCESSES IN GROWTH SILICON ON (111)SILICON IN ULTRAHIGH VACUUM [J].
ABBINK, HC ;
BROUDY, RM ;
MCCARTHY, GP .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) :4673-&
[2]  
BROERS AN, MICROBEAM ANAL 1980, P36
[3]   OPTIMIZATION OF MULTILAYER SOFT-X-RAY MIRRORS [J].
BRUIJN, MP ;
VERHOEVEN, J ;
VANDERWIEL, MJ .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1984, 219 (03) :603-606
[4]  
CRONWALD KD, 1982, SURFACE SCI, V117, P180
[5]   STUDY ON CONDENSATION AND EVAPORATION OF ALKALINE HALIDE CRYSTALS WITH MOLECULAR-BEAM METHODS .2. RELAXATION EFFECTS ON (100) SURFACE OF KCL [J].
DABRINGHAUS, H ;
MEYER, HJ .
JOURNAL OF CRYSTAL GROWTH, 1972, 16 (01) :31-+
[6]   THE USE OF PULSED LASER IRRADIATION IN SILICON MOLECULAR-BEAM EPITAXY - A COMPARATIVE LOW-ENERGY ELECTRON-DIFFRACTION STUDY [J].
DEJONG, T ;
DOUMA, WAS ;
SMIT, L ;
KORABLEV, VV ;
SARIS, FW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :888-898
[7]   SILICON MOLECULAR-BEAM EPITAXY ON GALLIUM-PHOSPHIDE [J].
DEJONG, T ;
DOUMA, WAS ;
VANDERVEEN, JF ;
SARIS, FW ;
HAISMA, J .
APPLIED PHYSICS LETTERS, 1983, 42 (12) :1037-1039
[8]   TRANSIENTS IN THE RATE OF CRYSTAL-GROWTH [J].
GILMER, GH .
JOURNAL OF CRYSTAL GROWTH, 1980, 49 (03) :465-474
[9]  
Heavens O.S., 1955, OPTICAL PROPERTIES T
[10]  
HENKE BL, 1982, ATOMIC DATA NUCLEAR, V27