THE FORMATION AND DECOMPOSITION OF WATER AND HYDROGEN ON GEX SI1-X(100)2X1

被引：14

作者：

SCHAEFER, JA

BROUGHTON, JQ

BEAN, JC

FARRELL, HH

机构：

[1] BELL COMMUN RES,MURRAY HILL,NJ 07974

[2] AT&T BELL LABS,MURRAY HILL,NJ 07974

[3] SUNY STONY BROOK,DEPT MAT SCI,STONY BROOK,NY 11794

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1986年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0368-2048(86)85040-X

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：127 / 136

页数：10

共 20 条

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[15] CHEMISORPTION OF H2O ON SI(100) [J].

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[16] MONOHYDRIDE AND DIHYDRIDE FORMATION AT SI(100) 2X1 - A HIGH-RESOLUTION ELECTRON-ENERGY LOSS SPECTROSCOPY STUDY [J].

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[17] THE ADSORPTION AND REACTION OF H2O ON CLEAN AND OXYGEN COVERED AG(110) [J].

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SEXTON, BA .

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[18] CLUSTER CALCULATIONS OF THE SURFACE DIMER STRUCTURE ON SI(100) SURFACES [J].

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[19]

VERWOERD WS, 1981, SURF SCI, V108, P585

[20] REINTERPRETATION OF THE SILICON-HYDROGEN STRETCH FREQUENCIES IN AMORPHOUS-SILICON [J].

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