NONINVASIVE PICOSECOND ULTRASONIC-DETECTION OF ULTRATHIN INTERFACIAL LAYERS - CFX AT THE AL/SI INTERFACE

被引：60

作者：

TAS, G ^{[1
]}

STONER, RJ ^{[1
]}

MARIS, HJ ^{[1
]}

RUBLOFF, GW ^{[1
]}

OEHRLEIN, GS ^{[1
]}

HALBOUT, JM ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

APPLIED PHYSICS LETTERS | 1992年 / 61卷 / 15期

关键词：

D O I：

10.1063/1.108427

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A picosecond ultrasonics technique has been used to detect interfacial fluorocarbon (CF(x)) layers as thin as 0.5 nm between aluminum and silicon. The presence of the CF(x) material reduces acoustic damping and heat loss from the Al film into the Si substrate. This provides a means for noninvasive identification of organic/polymeric contaminants at the buried interface and potentially for characterizing interfacial mechanical properties.

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页码：1787 / 1789

页数：3

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