INVESTIGATION OF REACTIVE-ION-ETCHING-RELATED FLUOROCARBON FILM DEPOSITION ONTO SILICON AND A NEW METHOD FOR SURFACE RESIDUE REMOVAL

被引：39

作者：

OEHRLEIN, GS

CLABES, JG

SPIRITO, P

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 05期

关键词：

D O I：

10.1149/1.2108695

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1002 / 1008

页数：7

共 17 条

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