INFLUENCE OF RESIDUAL COMPRESSIVE STRESS ON EROSION BEHAVIOR OF ARC EVAPORATION TITANIUM NITRIDE COATING

被引:20
作者
SUE, JA
TROUE, HH
机构
[1] Union Carbide Corp, United States
关键词
D O I
10.1016/0257-8972(88)90010-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
15
引用
收藏
页码:695 / 705
页数:11
相关论文
共 15 条
[1]   CHANGING THE SURFACE MECHANICAL-PROPERTIES OF SILICON AND ALPHA-AL2O3 BY ION-IMPLANTATION [J].
BURNETT, PJ ;
PAGE, TF .
JOURNAL OF MATERIALS SCIENCE, 1984, 19 (11) :3524-3545
[2]   LOCALIZED IMPACT DAMAGE IN GLASS [J].
KIRCHNER, HP ;
GRUVER, RM .
MATERIALS SCIENCE AND ENGINEERING, 1977, 28 (01) :153-160
[3]   EQUILIBRIUM PENNY-LIKE CRACKS IN INDENTATION FRACTURE [J].
LAWN, BR ;
FULLER, ER .
JOURNAL OF MATERIALS SCIENCE, 1975, 10 (12) :2016-2024
[4]   MICROFRACTURE BENEATH POINT INDENTATIONS IN BRITTLE SOLIDS [J].
LAWN, BR ;
SWAIN, MV .
JOURNAL OF MATERIALS SCIENCE, 1975, 10 (01) :113-122
[5]   MODE OF CHIPPING FRACTURE IN BRITTLE SOLIDS [J].
LAWN, BR ;
SWAIN, MV ;
PHILLIPS, K .
JOURNAL OF MATERIALS SCIENCE, 1975, 10 (07) :1236-1239
[6]   TI-NX COMPOUNDS DEPOSITED AT LOW-TEMPERATURE - GENERAL-ASPECTS OF THEIR PHASE-COMPOSITION [J].
MARTEV, IN ;
GRIGOROV, GI ;
PETROV, IG ;
DYNOWSKA, E .
THIN SOLID FILMS, 1985, 131 (3-4) :303-311
[7]   CHARACTERISTICS OF DC MAGNETRON, REACTIVELY SPUTTERED TINX FILMS FOR DIFFUSION-BARRIERS IN III-V SEMICONDUCTOR METALLIZATION [J].
NOEL, JP ;
HOUGHTON, DC ;
ESTE, G ;
SHEPHERD, FR ;
PLATTNER, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :284-287
[8]   INTERNAL-STRESS AND ADHERENCE OF TITANIUM NITRIDE COATINGS [J].
RICKERBY, DS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2809-2814
[9]   REACTIVE HIGH-RATE DC SPUTTERING - DEPOSITION RATE, STOICHIOMETRY AND FEATURES OF TIOX AND TINX FILMS WITH RESPECT TO THE TARGET MODE [J].
SCHILLER, S ;
BEISTER, G ;
SIEBER, W .
THIN SOLID FILMS, 1984, 111 (03) :259-268
[10]  
Sloof W. G., 1987, Surface Engineering, V3, P59