REACTIVE HIGH-RATE DC SPUTTERING - DEPOSITION RATE, STOICHIOMETRY AND FEATURES OF TIOX AND TINX FILMS WITH RESPECT TO THE TARGET MODE

被引：118

作者：

SCHILLER, S

BEISTER, G

SIEBER, W

机构：

来源：

THIN SOLID FILMS | 1984年 / 111卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90147-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：259 / 268

页数：10

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