EFFECT OF B, C, N, AND NE ION-IMPLANTATION ON OXIDATION OF POLYCRYSTALLINE CU

[1] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF [J]. NUCLEAR INSTRUMENTS & METHODS, 1971, 92 (04): : 481 - &

[2] MICROANALYSIS OF STABLE ISOTOPES OF OXYGEN BY MEANS OF NUCLEAR REACTIONS [J]. ANALYTICAL CHEMISTRY, 1967, 39 (14) : 1689 - &

[3] ANTILL JE, 1973, P INT C ION IMPLANTA, P415

[4] ASHWORTH V, 1973, P INT C ION IMPLANTA, P443

[5] USE OF RUTHERFORD BACKSCATTERING TO STUDY BEHAVIOR OF ION-IMPLANTED ATOMS DURING ANODIC-OXIDATION OF ALUMINUM - AR, KR, XE, K, RB, CS, CL, BR, AND I [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) : 1096 - 1102

[6] CROWDER BL, 1971, IBM TECH DISCL B, V14, P198

[7] DEARNALEY G, 1974, AERER7898 UK AT EN

[8] THERMAL OXIDATION OF SILICON AFTER ION-IMPLANTATION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) : 1603 - 1605

[9] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[10] Hauffe K., 1965, OXID MET

[1] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF [J]. NUCLEAR INSTRUMENTS & METHODS, 1971, 92 (04): : 481 - &

[2] MICROANALYSIS OF STABLE ISOTOPES OF OXYGEN BY MEANS OF NUCLEAR REACTIONS [J]. ANALYTICAL CHEMISTRY, 1967, 39 (14) : 1689 - &

[3] ANTILL JE, 1973, P INT C ION IMPLANTA, P415

[4] ASHWORTH V, 1973, P INT C ION IMPLANTA, P443

[5] USE OF RUTHERFORD BACKSCATTERING TO STUDY BEHAVIOR OF ION-IMPLANTED ATOMS DURING ANODIC-OXIDATION OF ALUMINUM - AR, KR, XE, K, RB, CS, CL, BR, AND I [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) : 1096 - 1102

[6] CROWDER BL, 1971, IBM TECH DISCL B, V14, P198

[7] DEARNALEY G, 1974, AERER7898 UK AT EN

[8] THERMAL OXIDATION OF SILICON AFTER ION-IMPLANTATION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) : 1603 - 1605

[9] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[10] Hauffe K., 1965, OXID MET