A PRACTICAL ELECTRON-BEAM DIRECT WRITING PROCESS TECHNOLOGY FOR SUBMICRON DEVICE FABRICATION

被引：10

作者：

OKAZAKI, S ^{[1
]}

MURAI, F ^{[1
]}

SUGA, O ^{[1
]}

SHIRAISHI, H ^{[1
]}

KOIBUCHI, S ^{[1
]}

机构：

[1] HITACHI CHEM CO LTD,YAMAZAKI WORKS,HITACHI,IBARAKI 317,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583913

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：402 / 404

页数：3

相关论文

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