PATTERNED PHOTONUCLEATION OF CHEMICAL VAPOR-DEPOSITION OF AL BY UV-LASER PHOTODEPOSITION

被引：65

作者：

TSAO, JY ^{[1
]}

EHRLICH, DJ ^{[1
]}

机构：

[1] MIT,LINCOLN LAB,LEXINGTON,MA 02173

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 06期

关键词：

D O I：

10.1063/1.95331

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：617 / 619

页数：3

共 17 条

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