NI/CR INTERFACE WIDTH DEPENDENCE ON SPUTTERED DEPTH

被引：21

作者：

DAVARYA, F

ROUSH, ML

FINE, J

ANDREADIS, TD

GOKTEPE, OF

机构：

[1] NBS,INST BASIC STAND,DIV SURFACE SCI,WASHINGTON,DC 20234

[2] USN,CTR SURFACE WEAP,SILVER SPRING,MD 20910

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571905

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：467 / 470

页数：4

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