MECHANISMS OF REACTIVE ION-BEAM SPUTTERING OF SILICON-NITRIDE IN PRESENCE OF N-15-LABELED OR D-LABELED AMMONIA

被引:13
作者
BOSSEBOEUF, A [1 ]
BOUCHIER, D [1 ]
RIGO, S [1 ]
机构
[1] UNIV PARIS 07,ECOLE NORMALE SUPER,PHYS SOLIDES GRP,F-75251 PARIS,FRANCE
关键词
D O I
10.1149/1.2108682
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
20
引用
收藏
页码:810 / 816
页数:7
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