CHARACTERIZATION OF SIO2-FILMS ON GLASS SUBSTRATE BY SOL-GEL AND VACUUM DEPOSITION METHODS

Silica films were deposited on soda-lime-silica glass substrate by two methods, sol-gel dip-coating and electron beam (EB) evaporation. Refractive index, infrared (IR) spectrum and effectiveness of the protection against H+ attack were used to investigate structure of the films. Sol-gel films have porous structure and contain many residual -OH groups in comparison with EB evaporated films. A scratch test, which enables the tribological properties of a surface to be measured, was performed to evaluate the adhesion forces of the films on glass substrate. The adhesion of sol-gel films was markedly improved by heat treatment, whereas that of EB evaporated films was lower by annealing.