LASER STUDIES OF THE REACTIVITY OF SIH WITH THE SURFACE OF A DEPOSITING FILM

被引：89

作者：

HO, P

BREILAND, WG

BUSS, RJ

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1989年 / 91卷 / 04期

关键词：

D O I：

10.1063/1.456971

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：2627 / 2634

页数：8

相关论文

共 34 条

[1] RADIATIVE LIFETIME MEASUREMENTS OF SIH(A2-DELTA) BY LASER-INDUCED FLUORESCENCE
BAUER, W
BECKER, KH
DUREN, R
HUBRICH, C
MEUSER, R
[J]. CHEMICAL PHYSICS LETTERS, 1984, 108 (06) : 560 - 561
[2] GAS-PHASE SILICON ATOMS IN SILANE CHEMICAL VAPOR-DEPOSITION - LASER-EXCITED FLUORESCENCE MEASUREMENTS AND COMPARISONS WITH MODEL PREDICTIONS
BREILAND, WG
HO, P
COLTRIN, ME
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (04) : 1505 - 1513
[3] COMPARISONS BETWEEN A GAS-PHASE MODEL OF SILANE CHEMICAL VAPOR-DEPOSITION AND LASER-DIAGNOSTIC MEASUREMENTS
BREILAND, WG
COLTRIN, ME
HO, P
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (09) : 3267 - 3273
[4] REACTIVE STICKING COEFFICIENTS FOR SILANE AND DISILANE ON POLYCRYSTALLINE SILICON
BUSS, RJ
HO, P
BREILAND, WG
COLTRIN, ME
[J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (08) : 2808 - 2819
[5] MOLECULAR REACTIONS AT THE FILM SURFACE IN PLASMA POLYMERIZATION
BUSS, RJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1919 - 1920
[6] MOLECULAR REACTIONS AT PLASMA-POLYMERIZED FILM SURFACES
BUSS, RJ
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (08) : 2977 - 2982
[7] LASER PROBING OF GALLIUM ATOM INTERACTIONS WITH SILICON(100) SURFACES
CARLETON, KL
LEONE, SR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (04): : 1141 - 1146
[8] CARLETON KL, 1987, THESIS U COLORADO BO
[9] CARLSON DE, 1984, SEMICONDUCTORS SEM D, V21
[10] Chapman B., 1980, GLOW DISCHARGE PROCE

← 1 2 3 4 →