THERMAL DISTRIBUTION AND THE EFFECT ON RESIST SENSITIVITY IN ELECTRON-BEAM DIRECT WRITE

[1] RESIST HEATING EFFECT IN DIRECT ELECTRON-BEAM WRITING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 853 - 857

[2] VAPOR DEVELOPMENT OF POLY(OLEFIN SULFONE) RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) : 525 - 528

[3] Dean J. A., 1973, LANGES HDB CHEM

[4] Dossel K.-F., 1986, Microelectronic Engineering, V5, P97, DOI 10.1016/0167-9317(86)90035-3

[5] EIB N, 1985, J VAC SCI TECHNOL B, V1, P425

[6] EIB N, 1987, VLSI ELECT MICROSTRU, V16, pCH4

[7] FRECHET JMJ, 1986, J IMAGING SCI, V30, P59

[8] GOZDZ AS, 1987, SOLID STATE TECHNOL, V30, P75

[9] EL3 SYSTEM FOR QUARTER-MICRON ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2028 - 2032

[10] TEMPERATURE EFFECTS ON POSITIVE ELECTRON RESISTS IRRADIATED WITH ELECTRON-BEAM AND DEEP-UV LIGHT [J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (05) : 1441 - 1452

[1] RESIST HEATING EFFECT IN DIRECT ELECTRON-BEAM WRITING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 853 - 857

[2] VAPOR DEVELOPMENT OF POLY(OLEFIN SULFONE) RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) : 525 - 528

[3] Dean J. A., 1973, LANGES HDB CHEM

[4] Dossel K.-F., 1986, Microelectronic Engineering, V5, P97, DOI 10.1016/0167-9317(86)90035-3

[5] EIB N, 1985, J VAC SCI TECHNOL B, V1, P425

[6] EIB N, 1987, VLSI ELECT MICROSTRU, V16, pCH4

[7] FRECHET JMJ, 1986, J IMAGING SCI, V30, P59

[8] GOZDZ AS, 1987, SOLID STATE TECHNOL, V30, P75

[9] EL3 SYSTEM FOR QUARTER-MICRON ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2028 - 2032

[10] TEMPERATURE EFFECTS ON POSITIVE ELECTRON RESISTS IRRADIATED WITH ELECTRON-BEAM AND DEEP-UV LIGHT [J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (05) : 1441 - 1452