共 10 条
- [1] EXPERIMENTAL RESULTS FROM FAST ELECTRON PATTERN GENERATOR - A VARIABLE SHAPED BEAM MACHINE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 73 - 77
- [3] EB60 - AN ADVANCED DIRECT WAFER EXPOSURE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR HIGH-THROUGHPUT, HIGH-PRECISION, SUBMICRON PATTERN WRITING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 61 - 65
- [5] AN ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR SUB-MICRON VHSIC DEVICE FABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 106 - 111
- [6] THE EFFECT OF ACCELERATION VOLTAGE ON LINEWIDTH CONTROL WITH A VARIABLE-SHAPED ELECTRON-BEAM SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 105 - 109
- [7] RALF HK, 1982, 10TH INT C EL ION BE, P219
- [8] SUZUKI K, 1983, JPN J APPL PHYS S, V22, P175
- [9] WADA H, 1981, P MICRO CIRCUIT ENG, P139
- [10] A HIGH-DOSE AND HIGH-ACCURACY VARIABLE SHAPED ELECTRON-BEAM EXPOSURE SYSTEM FOR QUARTERMICRON DEVICE FABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 70 - 74