ROLE OF OXYGEN CONTAMINATION ON TITANIUM NITRIDING

被引：9

作者：

SAILLARD, P ^{[1
]}

GICQUEL, A ^{[1
]}

AMOUROUX, J ^{[1
]}

MONCOFFRE, N ^{[1
]}

TOUSSET, J ^{[1
]}

机构：

[1] UNIV LYON 1,INST PHYS NUCL LYON,CNRS,IN2P3,F-69622 VILLEURBANNE,FRANCE

来源：

SURFACE AND INTERFACE ANALYSIS | 1990年 / 16卷 / 1-12期

关键词：

D O I：

10.1002/sia.7401601110

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Titanium nitridation has been achieved in a tubular reactor under a radio frequency low‐pressure plasma. The influence of the plasma working parameters (substrate temperature, nature of the gas phase and plasma input power) on the superficial nitride/oxide ratio has been investigated. The influence of the oxygen bulk contamination on nitridation kinetics is also reported. Copyright © 1990 John Wiley & Sons Ltd.

引用

页码：530 / 534

页数：5

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