共 19 条
[1]
BOSISIO RG, 1973, J PHYS E, V56, P14
[2]
RELATION OF POLYMER STRUCTURE TO PLASMA-ETCHING BEHAVIOR - ROLE OF ATOMIC FLUORINE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (04)
:1578-1584
[3]
Chou N. J., 1986, Microelectronic Engineering, V5, P375, DOI 10.1016/0167-9317(86)90066-3
[4]
PLASMA-ASSISTED ETCHING IN MICROFABRICATION
[J].
ANNUAL REVIEW OF MATERIALS SCIENCE,
1983, 13
:91-116
[6]
EGITTO F, 1985, 7TH P INT S PLASM CH, V3, P983
[7]
PLASMA-ETCHING OF ORGANIC MATERIALS .1. POLYIMIDE IN O2-CF4
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1985, 3 (03)
:893-904
[9]
FLAMM DL, 1979, SOLID STATE TECHNOL, V22, P109
[10]
ELECTROSTATIC-PROBE ANALYSIS OF MICROWAVE PLASMAS USED FOR POLYMER ETCHING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1987, 5 (01)
:347-354