ELECTROSTATIC-PROBE MEASUREMENTS IN THE GLOW-DISCHARGE PLASMA OF A DC MAGNETRON SPUTTERING SYSTEM

被引:68
作者
PETROV, I
ORLINOV, V
IVANOV, I
KOURTEV, J
机构
关键词
D O I
10.1002/ctpp.2150280207
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
引用
收藏
页码:157 / 167
页数:11
相关论文
共 16 条
[1]  
Chapman B., 1980, GLOW DISCHARGE PROCE
[2]  
CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453
[3]   MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS [J].
ESER, E ;
OGILVIE, RE ;
TAYLOR, KA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :199-202
[4]   PLASMA PRODUCTION WITH DC DISCHARGE PLANAR MAGNETRON DEVICE FOR THIN-FILM PREPARATION [J].
FUJITA, H ;
YAGURA, S ;
UENO, H ;
NAGANO, M .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (09) :1699-1706
[5]  
GREENE JE, 1987, SOLID STATE TECHNOL, V30, P115
[6]   A REVIEW OF THE PRESENT UNDERSTANDING OF THE ROLE OF ION SURFACE INTERACTIONS AND PHOTOINDUCED REACTIONS DURING VAPOR-PHASE CRYSTAL-GROWTH [J].
GREENE, JE ;
MOTOOKA, T ;
SUNDGREN, JE ;
ROCKETT, A ;
GORBATKIN, S ;
LUBBEN, D ;
BARNETT, SA .
JOURNAL OF CRYSTAL GROWTH, 1986, 79 (1-3) :19-32
[7]  
HARPER JME, 1987, SOLID STATE TECHNOL, V30, P129
[8]  
HARPER JME, 1984, ION BOMBARDMENT MODI, P127
[9]   PLASMA DIAGNOSTICS IN ION-ASSISTED PHYSICAL VAPOR-DEPOSITION SYSTEMS [J].
HURLEY, RE .
VACUUM, 1984, 34 (3-4) :351-355
[10]  
Laframboise J. G., 1966, 100 U TOR I AER STUD