TUNABLE UV LASER PHOTOLYSIS OF ORGANOMETALLICS WITH PRODUCT DETECTION BY LASER MASS-SPECTROSCOPY - TRIMETHYLALUMINUM

被引：24

作者：

BEUERMANN, T

STUKE, M

机构：

来源：

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY | 1989年 / 49卷 / 02期

关键词：

D O I：

10.1007/BF00332274

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：145 / 148

页数：4

共 23 条

[11] ANISOTROPIC PHOTODISSOCIATION OF CADMIUM DIMETHYL [J].

JONAH, C ;

CHANDRA, P ;

BERSOHN, R .

JOURNAL OF CHEMICAL PHYSICS, 1971, 55 (04) :1903-&

[12]

LARCIPRETE R, 1986, J PHYS CHEM-US, V90, P4586

[13]

LOKAI P, 1987, LASER OPTOELEKTRONIK, V3, P296

[14]

MAYER TM, 1981, J VAC SCI TECHNOL B, V4, P176

[15] PULSED VISIBLE LASER PHOTOLYSIS OF B(C2H5)3, AL2(CH3)6, GA(CH3)3, AND IN(CH3)3 - MULTIPHOTON IONIZATION SPECTRA OF AL, GA, AND IN ATOMS [J].

MITCHELL, SA ;

HACKETT, PA .

JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (10) :4815-4822

[16]

OKAZAKI S, 1988, P INT C MICROLITHOGR

[17]

PILCHER G, 1982, CHEM METALCARBON BON, V1, P69

[18] FOCUSED ION-BEAM INDUCED DEPOSITION OF GOLD [J].

SHEDD, GM ;

LEZEC, H ;

DUBNER, AD ;

MELNGAILIS, J .

APPLIED PHYSICS LETTERS, 1986, 49 (23) :1584-1586

[19] LASER MULTIPHOTON IONIZATION SPECTRUM OF ALCH3 RADICALS FORMED BY UV EXCIMER LASER PHOTOLYSIS OF GASEOUS TMA AT 248 NM AND 193 NM [J].

ZHANG, Y ;

STUKE, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (07) :L1349-L1351

[20] LASER MASS-SPECTROMETRIC DETECTION OF ALH MOLECULES AS COLLISION-FREE EXCIMER LASER PHOTOPRODUCTS FROM ALUMINUM ALKYLS [J].

ZHANG, Y ;

STUKE, M .

CHEMICAL PHYSICS LETTERS, 1988, 149 (03) :310-315

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